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Development history

  • Development history
2024.02
2024.02

Hefei HISEMI is located in Hefei High-tech Zone Tiantangzhai Road No. 66 new factory put into use

2021.06
2021.06

Hefei Hisemi Semiconductor Co., LTD was established

2020.12
2020.12

Renamed as Chizhou Hisemi Electronic Technology Co., LTD

05
05

Hisemi Group headquarters 20000 square meters of factory building, 12 "wafer seal test project formally put into production

2018.10
2018.10

Wuxi Hisemi Electronic Technology Co., LTD was established

09
09

Shenzhen Hisemi Semiconductor Co., Ltd was established

01
01

Acquiring Hefei Huada Semiconductor Co., LTD

01
01

Acquiring Shenzhen Hisemi Fubao Semiconductor Co., LTD

2017.11
2017.11

Chizhou Taimeida changed its name to Chizhou Hisemi Electronic Technology Co., LTD., and the company started A-share listing plan

2014.10
2014.10

Chizhou Taimeida electronic company was formally established

2013.07
2013.07

Chizhou Huati Semiconductor Co., Ltd. was established with substantial integrated circuit packaging and testing capabilities

05
05

Hefei Huada Semiconductor Co., LTD was established

2010.03
2010.03

Shenzhen Hisemi Fubao Semiconductor Co., LTD was established

2008.06
2008.06

Wuxi Huayu Core Semiconductor Co., LTD was established

2007.03
2007.03

Shenzhen Hisemi Semiconductor Co., Ltd. was established, the first company founded by Hisemi.

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